MILA-5000 SERIES
Applications
- Crystal annealing of ferroelectric thin films..
- Diffusion annealing, oxide film deposition annealing after ion implantation.
- Sintering, alloying treatment of Si and compound wafers.
- Glass substrate uniform temperature annealing.
- Thermal cycle, thermal shock, thermal fatigue testing.
- Temperature programmed desorption testing, catalytic effect testing.
MILA-5000 series
| Model | MILA-5000-P-N (high temperature type) |
MILA-5000-P-F (uniform temperature type) |
|---|---|---|
| Temperature Range | RT～1200℃ | RT～800℃ |
| Sample Size | ?20 × t2 (mm) | |
| Atmosphere | Air, Vacuum, Gas flow | |
*Vacuum pumping system is optional.
*Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material.
